Electrochemical behavior of tin(II) at the electrodeposition tin sulfide on Mo-electrode
AbstractThe electrochemical behavior of tin ions (II) and thiosulfate ions (S2O32-) on the Mo electrode in various concentrations and potential scan rate was studied by voltammetric method. Dependence of oxidation and reduction currents from concentrations of tin (II) ions and scan rate was obtained. It was showed the diffusion nature of the limiting stage of reduction. It was determined the different voltammograms’s character with a sweep potential to E = -1300mV or -1500mV for simultaneous reduction ions Sn (II) and (S2O32-) from 0,2 M sodium citrate on molybdenum electrode. Nanocrystalline films SnS with a thickness of 1 µ were obtained by the electrodeposition on glass/SnO2.
1 Valiukonis G, Guseinova A, Krivaite G, Sileica A (1990) Phys Status Solidi B 135:299-307. http://dx.doi.org/10.1002/pssb.2221350130
2 Johnson JB, Jones H, Latham BS, Parker JD, Engelken R, Barber C (1999) Semicond Sci Tech 14:501. http://dx.doi.org/10.1088/0268-1242/14/6/303
3 Sharon M, Basavaswaran K, Sathe NP (1985) J Sci Ind Res India 44:593.
4 Ristov M, Sinadinovski G, Mitreski M, Ristova M (2001) Sol Energ Mat Sol C 69:17-24. http://dx.doi.org/10.1016/S0927-0248(00)00355-X
5 Ortiz A, Alonso JC, Garcia M, Toriz J (1996) Semicond Sci Tech 11:243. http://dx.doi.org/10.1088/0268-1242/11/2/017
6 Koteswara Reddy N, Ramakrishna Reddy KT, Fisher G, Best R, Dutta PK (1999) Journal of Physics D: Applied Physics. 32:988. http://dx.doi.org/10.1088/0022-3727/32/9/307
7 Hankare PP, Jadhav AV, Chate PA, Rathod KC, Chavan PA, Ingole SA (2008) J Alloy Compd 463:581-584. http://dx.doi.org/10.1016/j.jallcom.2007.11.065
8 Ghosh B, Das M, Banerjee P, Das S (2008) Appl Surf Sci 254:6436–6440. http://dx.doi.org/10.1016/j.apsusc.2008.04.008
9 Tanuevski A, Poelman D (2003) Sol Energ Mat Sol C 80:297–303. http://dx.doi.org/10.1016/j.solmat.2003.06.002
10 Zainal Z, Hussein MZ, Ghazali A (1996) Sol Energ Mat Sol C 40:347–357. http://dx.doi.org/10.1016/0927-0248(95)00157-3
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